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SENSIVA PA 20

Phenethyl Alcohol Ethylhexylglycerin

SENSIVA PA 20 is a multifunctional cosmetic additive based on ethylhexylglycerin and phenethyl alcohol. Its unique properties make it suitable for the use in a wide range of cosmetic applications. It combines the excellent skin care and deodorising properties of ethylhexylglycerin with the antimicrobial properties of phenethyl alcohol. Phenethyl alcohol is a nature-identical fragrance ingredient with a mild flowery rose-like scent which can mask possible unpleasant odours of other ingredients. Its antimicrobial properties are enhanced by the boosting effect of ethylhexylglycerin. sensiva® PA 20 is suitable as an antimicrobial stabiliser for preservative-free cosmetics.
EUXYL K 830

Phenoxyethanol Ethylhexylglycerin* Octenidine HCl

EUXYL K 830 is a liquid cosmetic preservative based on Phenoxyethanol combined with the OCX – Efficacy Enhancing System. The addition of OCX significantly reduces the interfacial tension at the cell membrane of microorganisms. This allows Phenoxyethanol an easier contact, improving its antimicrobial effect through a better ability to attack the cell membrane
EUXYL K 703

Phenoxyethanol Benzoic Acid Dehydroacetic Acid

EUXYL K 703 is a liquid cosmetic preservative, which can be used in leave-on and rinse-off products as well as for wet wipes. euxyl® K 703 was developed for use in cosmetic formulations with a skin-friendly pH value of up to 6. EUXYL K 703 is particularly effective in non-ionic systems. It has a broad, balanced spectrum of effect against bacteria, yeasts and mould fungi as well as a good vapour phase effectiveness.
EUXYL K 720

Benzoic Acid Caprylyl Glycol Propylene Glycol

EUXYL K 720 is a liquid colourless cosmetic preservative based on well-known broadly accepted molecules. This synergistic combination of the actives Benzoic Acid and Caprylyl Glycol is designed for modern wet wipes, rinse-off and leave-on applications with low pH levels. The preservative is an ideal solution for sensitive applications. No discolouration is to be expected.
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