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PEEL OFF MASK URBAN D-POLLUTION F919

Diatomaceous Earth,Algin,Calcium Sulfate,Bentonite,Charcoal Powder,Chlorella Vulgaris Powder,Tetrasodium Pyrophosphate,Kaolin,Zeolite,Cyamopsis Tetragonoloba Gum,Panax Ginseng Root Powder

Peel Off Mask Urban D-Pollution including chlorella, white clay, white ginseng and charcoal. It has black colour and neutral odour. Drying time 20 min. It has classic base, which has been proven that reduces natural water loss, to concentrate it within upper epidermis skin layer. Skin is immediately and deeply hydrated. It removes 84% of fine particles of the skin.

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SENSIVA SC 10

Caprylyl glycol Ethylhexylglycerin

SENSIVA SC 10 is a multifunctional cosmetic additive based on ethylhexylglycerin and caprylyl glycol. Its unique properties make it suitable for use in a wide range of cosmetic applications. It combines the excellent skin care and deodorising properties of ethylhexylglycerin with the moisturising and antimicrobial properties of caprylyl glycol. sensiva® SC 10 is a mild humectant and skin emollient with a unique skin feel. Additionally, it can contribute to the antimicrobial stability of cosmetic formulations. It can also be used to improve the efficacy of traditional cosmetic preservatives, such as parabens or phenoxyethanol.

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S&M BRONOPOL

2-Bromo-2-nitropropane-1,3-diol

S&M BRONOPOL is a single active ingredient and suitable for leave-on, rinse-off and wet wipes applications. Product benefits include excellent bactericidal effect and strong activity against gram-negative bacteria (Pseudomonas sp.). This crystalline powder is a powerful preservative even at low use levels and suitable for a neutral pH rinse-off application

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S&M PHENOXYETHANOL

Phenoxyethanol

S&M PHENOXYETHANOL is suitable for leave-on and rinse-off products. Good head space protection. Stable to hydrolysis, temperature and pH. Globally approved. s&m Phenoxyethanol is fully effective both in anionic as well as cationic systems. Effective in pH ranges up to 12

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