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PEEL OFF MASK URBAN D-POLLUTION F919

Diatomaceous Earth,Algin,Calcium Sulfate,Bentonite,Charcoal Powder,Chlorella Vulgaris Powder,Tetrasodium Pyrophosphate,Kaolin,Zeolite,Cyamopsis Tetragonoloba Gum,Panax Ginseng Root Powder

Peel Off Mask Urban D-Pollution including chlorella, white clay, white ginseng and charcoal. It has black colour and neutral odour. Drying time 20 min. It has classic base, which has been proven that reduces natural water loss, to concentrate it within upper epidermis skin layer. Skin is immediately and deeply hydrated. It removes 84% of fine particles of the skin.

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SENSIDIN DO

Propylene glycol Ethylhexylglycerin * Octenidine HCI

SENSIDIN DO combines the well-known deodorant and skin care properties of ethylhexylglycerin with the antimicrobial properties of octenidine HCl. The synergistic combination of these active ingredients provides good efficacy in deodorants at very low use concentrations. In order to achieve practical use concentrations for deodorants, this combination has been diluted with the widely-used solvent and humectant, propylene glycol. sensidin® DO reliably inhibits the growths and multiplication of odour-causing bacteria on the skin. sensidin® DO is a clear colourless to light yellow liquid concentrate with a slight characteristic odour.

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SENSIVA PA 20

Phenethyl Alcohol Ethylhexylglycerin

SENSIVA PA 20 is a multifunctional cosmetic additive based on ethylhexylglycerin and phenethyl alcohol. Its unique properties make it suitable for the use in a wide range of cosmetic applications. It combines the excellent skin care and deodorising properties of ethylhexylglycerin with the antimicrobial properties of phenethyl alcohol. Phenethyl alcohol is a nature-identical fragrance ingredient with a mild flowery rose-like scent which can mask possible unpleasant odours of other ingredients. Its antimicrobial properties are enhanced by the boosting effect of ethylhexylglycerin. sensiva® PA 20 is suitable as an antimicrobial stabiliser for preservative-free cosmetics.

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S&M PHENOXYETHANOL

Phenoxyethanol

S&M PHENOXYETHANOL is suitable for leave-on and rinse-off products. Good head space protection. Stable to hydrolysis, temperature and pH. Globally approved. s&m Phenoxyethanol is fully effective both in anionic as well as cationic systems. Effective in pH ranges up to 12

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