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EUXYL K 701

Phenoxyethanol Benzoic Acid Dehydroacetic Acid Ethylhexylglycerin

EUXYL K 701 is a liquid cosmetic preservative, which can be used in leave-on as well as rinse-off products. EUXYL K 701 was developed for use in cosmetic formulations with a skin-friendly pH value of up to 6. EUXYL K 701 is particularly effective in non-ionic systems. It has a broad, balanced spectrum of effect against bacteria, yeasts and mould fungi as well as a good vapour phase effectiveness.

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SENSIVA PA 20

Phenethyl Alcohol Ethylhexylglycerin

SENSIVA PA 20 is a multifunctional cosmetic additive based on ethylhexylglycerin and phenethyl alcohol. Its unique properties make it suitable for the use in a wide range of cosmetic applications. It combines the excellent skin care and deodorising properties of ethylhexylglycerin with the antimicrobial properties of phenethyl alcohol. Phenethyl alcohol is a nature-identical fragrance ingredient with a mild flowery rose-like scent which can mask possible unpleasant odours of other ingredients. Its antimicrobial properties are enhanced by the boosting effect of ethylhexylglycerin. sensiva® PA 20 is suitable as an antimicrobial stabiliser for preservative-free cosmetics.

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S&M BRONOPOL

2-Bromo-2-nitropropane-1,3-diol

S&M BRONOPOL is a single active ingredient and suitable for leave-on, rinse-off and wet wipes applications. Product benefits include excellent bactericidal effect and strong activity against gram-negative bacteria (Pseudomonas sp.). This crystalline powder is a powerful preservative even at low use levels and suitable for a neutral pH rinse-off application

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S&M PHENOXYETHANOL

Phenoxyethanol

S&M PHENOXYETHANOL is suitable for leave-on and rinse-off products. Good head space protection. Stable to hydrolysis, temperature and pH. Globally approved. s&m Phenoxyethanol is fully effective both in anionic as well as cationic systems. Effective in pH ranges up to 12

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